The influence of processing parameters in spin - coating was explored.

探索旋涂法制备工艺参数对薄膜结构的影响.

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The mathematics model that showed photoresist spin coating thickness evolvement on spherical surface was put forward.

提出了球面旋涂微米级厚度光刻胶膜层薄化率公式及径向位置演变公式,并得到了膜厚分布的演变公式.

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Deposit - dip - spin ( DDS ) coating method, a composite nano - powder sample preparation method for atomic force microscope ( AFM ) measurement is introduced.

介绍了一种改进旋涂法 —— DDS 涂膜法 ( Deposit-Dip-Spin-coating), 主要用来制备纳米粉体原子力显微镜 ( AFM ) 分析样品.

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