Thin film manganin gages and ytterbium gages were fabricated by magnetron sputtering.

采用磁控溅射法制备锰铜薄膜,溅射和真空蒸发法制备镱薄膜.

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Magnetically controlled cathod plasma sputtering technique was used to manufacture the plating manganin film.

用磁控溅射低温沉积镀膜技术制做锰铜薄膜,能够保持薄膜中锰、铜、镍成份的相对稳定和锰铜合金正六面三元固溶体金相结构的特性.

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