The epi process has being improved as the modern device fabrication process develops.

摘要在双极型器件的制造工艺中,外延层的质量一直是至关重要的因素之一.

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The key issue in large tower device fabrication is to guarantee the linearity, rectangularity and parallel.

如何保证超长容器的“三度”,即直线度 、 垂直度和平行度,是制造大型塔器的关键问题.

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Knowledge of semiconductor device fabrication process, basic training of semiconductor device physics, good English.

半导体器件制造的知识, 基本的半导体器件物理训练, 英语好.

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